Protective coatings for organic electronic devices made using atomic layer deposition and molecular layer deposition techniques
US9660205B2 · kind B2 · utility
9Cited by
7References
3Claims
0Family size
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Key dates
| Filing date | Jun 22, 2008 |
| Grant date | May 23, 2017 |
| Priority date | — |
| Expiry date | Jan 12, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/26
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Coatings are applied on a flexible substrate using atomic layer deposition and molecular layer deposition methods. The coatings have thickness of up to 100 nanometers. The coatings include layers of an inorganic material such as alumina, which are separated by flexibilizing layers that are deposited with covalent chemical linkage to the inorganic material and which are one or more of silica deposited by an atomic layer deposition process; an organic polymer that is deposited by a molecular layer deposition process, or a hybrid organic-inorganic polymer that is deposited by an molecular layer deposition process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.