Patent · US Active

Plasma vapor chamber and antimicrobial applications thereof

US9662412B2 · kind B2 · utility

7Cited by
6References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateFeb 11, 2016
Grant dateMay 30, 2017
Priority date
Expiry dateFeb 11, 2036

Classification

  • Technology area (CPC A)Human Necessities
  • CPC primaryA61L2202/122
  • WIPO fieldMedical technology
  • WIPO sectorInstruments

Abstract

Exemplary apparatuses and methods of killing or deactivating bacteria are disclosed herein. An exemplary apparatus for killing or deactivating bacteria includes a plasma vapor chamber. The plasma vapor chamber has a vapor inlet for allowing a vapor into the chamber, a high voltage electrode, one or more grounding electrodes. The one or more grounding electrodes at least partially surrounding the plasma vapor chamber. The plasma vapor chamber includes an outlet for allowing fluid to flow out of the chamber. When the chamber is filled with vapor for a period of time sufficient to saturate the chamber with vapor, the high voltage electrode is energized to generate plasma throughout the chamber.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.