Patent · US Active

Characterization of polymer and colloid solutions

US9664608B2 · kind B2 · utility

2Cited by
8References
21Claims
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Key dates

Filing dateAug 20, 2014
Grant dateMay 30, 2017
Priority date
Expiry dateNov 29, 2034

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01N2201/1224
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

Simultaneous Multiple Sample Light Scattering systems and methods can be used for polymer stability testing and for applying stressors to polymer or colloid solutions including heat stress, ultrasound, freeze/thaw cycles, shear stress and exposure to different substances and surfaces, among others, that create a polymer stress response used to characterize the polymer solution and stability.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.