Fabrication of low defectivity electrochromic devices

US9664974B2 · kind B2 · utility

Assignee

• View, Inc. · US

Inventors

• Mark Kozlowski · Windsor, US
• Eric W. Kurman · Healdsburg, US
• Zhongchun Wang · Milpitas, US
• Mike Scobey · Santa Rosa, US
• Jeremy A. Dixon · Fremont, US
• Anshu A. Pradhan · Fremont, US
• Robert T. Rozbicki · Los Gatos, US

Key dates

• Filing date: Dec 22, 2009
• Grant date: May 30, 2017
• Expiry date: Mar 18, 2030

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C03C2217/94
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

Prior electrochromic devices frequently suffer from high levels of defectivity. The defects may be manifest as pin holes or spots where the electrochromic transition is impaired. This is unacceptable for many applications such as electrochromic architectural glass. Improved electrochromic devices with low defectivity can be fabricated by depositing certain layered components of the electrochromic device in a single integrated deposition system. While these layers are being deposited and/or treated on a substrate, for example a glass window, the substrate never leaves a controlled ambient environment, for example a low pressure controlled atmosphere having very low levels of particles. These layers may be deposited using physical vapor deposition.