Patent · US Active

Wiring substrate and manufacturing method thereof

US9666542B2 · kind B2 · utility

0Cited by
2References
5Claims
0Family size

Assignee

Inventor

Key dates

Filing dateSep 24, 2014
Grant dateMay 30, 2017
Priority date
Expiry dateApr 16, 2035

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T29/49165
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A wiring substrate is provided with a support substrate (31), an insulating layer (32), and a wiring layer (33). The support substrate (31) is formed with a hole (34) including an opening portion in one surface of the support substrate (31). The insulating layer (32) is formed on a surface of the support substrate (31) opposite to the one surface thereof including the opening portion. The wiring layer (33) includes a wiring pattern of a predetermined structure on the insulating layer (32). Further, an orthographic projection to be obtained when the wiring pattern is projected on a predetermined surface of the support substrate (31), and an orthographic projection to be obtained when the hole (34) is projected on the predetermined surface of the support substrate (31) include a shared portion.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.