Resin, resist composition and method for producing resist pattern
US9671691B2 · kind B2 · utility
2Cited by
11References
12Claims
0Family size
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Key dates
| Filing date | Sep 15, 2015 |
| Grant date | Jun 6, 2017 |
| Priority date | — |
| Expiry date | Sep 15, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/325
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A resist composition includes (A1) a resin which includes a structural unit represented by formula (a4), a structural unit having a cyclic ether, and the resin has no acid-labile group, (A2) a resin having an acid-labile group, and an acid generator:wherein R3 represents a hydrogen atom or a methyl group, and R4 represents a C1 to C24 saturated hydrocarbon group having a fluorine atom and a methylene group contained in the saturated hydrocarbon group may be replaced by an oxygen atom or a carbonyl group.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.