Digital exposure device using GLV and digital exposure device using DMD
US9671700B2 · kind B2 · utility
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12Claims
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Key dates
| Filing date | Sep 4, 2013 |
| Grant date | Jun 6, 2017 |
| Priority date | — |
| Expiry date | Sep 24, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70275
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A digital exposure device including a GLV or a DMD. The digital exposure device also includes: a stage to support and move a substrate in a scan direction; an optical system disposed between the stage and the GLV or the DMD, to form a pattern on the substrate by modulating light received from the GLV or the DMD; and a control unit to control the a width of the pattern by a unit, the unit being obtained by dividing the width of the pattern by a natural number m, in the second direction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.