Semiconductor device and method of fabricating the same
US9673276B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 27, 2016 |
| Grant date | Jun 6, 2017 |
| Priority date | — |
| Expiry date | Jun 27, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10B63/30
Abstract
A semiconductor device may include a semiconductor substrate including an active region defined by a trench, a device isolation layer provided in the trench to surround the active region, a gate electrode extending in a direction crossing the active region, and formed on the active region and the device isolation layer, and a gate insulating layer between the active region and the gate electrode. The active region may have a first conductivity type, and the device isolation layer may include a first silicon oxide layer on an inner surface of the first trench and a different layer, selected from one of first metal oxide layer and a negatively-charged layer, on the first silicon oxide layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.