Patent · US Active

Marking base composition and marking base using the same

US9676912B2 · kind B2 · utility

0Cited by
6References
8Claims
0Family size

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Key dates

Filing dateOct 8, 2014
Grant dateJun 13, 2017
Priority date
Expiry dateSep 16, 2035

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC08J2400/00
  • WIPO fieldBasic materials chemistry
  • WIPO sectorChemistry

Abstract

To provide a technique related to a marking base that allows clear marking by ink and is excellent in thermal resistance and chemical resistance. A marking base composition contains inorganic particles of 27 to 50 mass %, an inorganic binder of 5 to 20 mass %, an organic binder of 3 to 16 mass %, a thermal expansion resin of 1 to 3 mass %, and an organic solvent.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.