Marking base composition and marking base using the same
US9676912B2 · kind B2 · utility
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8Claims
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Key dates
| Filing date | Oct 8, 2014 |
| Grant date | Jun 13, 2017 |
| Priority date | — |
| Expiry date | Sep 16, 2035 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08J2400/00
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
To provide a technique related to a marking base that allows clear marking by ink and is excellent in thermal resistance and chemical resistance. A marking base composition contains inorganic particles of 27 to 50 mass %, an inorganic binder of 5 to 20 mass %, an organic binder of 3 to 16 mass %, a thermal expansion resin of 1 to 3 mass %, and an organic solvent.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.