Patent · US Active

Optoelectronic gan-based component having increased ESD resistance via a superlattice and method for the production thereof

US9680052B2 · kind B2 · utility

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Key dates

Filing dateApr 23, 2014
Grant dateJun 13, 2017
Priority date
Expiry dateApr 23, 2034

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10H20/8252
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

An optoelectronic component includes a semiconductor layer structure having a quantum film structure, and a p-doped layer arranged above the quantum film structure, wherein the p-doped layer includes at least one first partial layer and a second partial layer, and the second partial layer has a higher degree of doping than the first partial layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.