Optoelectronic gan-based component having increased ESD resistance via a superlattice and method for the production thereof
US9680052B2 · kind B2 · utility
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Key dates
| Filing date | Apr 23, 2014 |
| Grant date | Jun 13, 2017 |
| Priority date | — |
| Expiry date | Apr 23, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10H20/8252
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An optoelectronic component includes a semiconductor layer structure having a quantum film structure, and a p-doped layer arranged above the quantum film structure, wherein the p-doped layer includes at least one first partial layer and a second partial layer, and the second partial layer has a higher degree of doping than the first partial layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.