Method of generating a metamaterial, and a metamaterial generated thereof
US9683991B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 6, 2012 |
| Grant date | Jun 20, 2017 |
| Priority date | — |
| Expiry date | Jan 27, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F2203/10
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method of generating a metamater-operable in the visible-infrared range is provided. The method comprises a) depositing a layer of a conductive material on a substrate; b) forming a layer of electron beam resist on the layer of conductive material; c) patterning the layer of electron beam resist using electron beam lithography to form a patterned substrate; d) depositing a layer of a noble metal on the patterned substrate; and e) removing the resist. A metamaterial operable in the visible-infrared range comprising split-ring resonators having a least line width of about 20 nm to about 40 nm on a substrate is provided. A transparent photonic device or a sensor for chemical or biological sensing comprising the metamaterial is also provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.