Ventilation systems for use with a plasma treatment system
US9685306B2 · kind B2 · utility
0Cited by
5References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 24, 2015 |
| Grant date | Jun 20, 2017 |
| Priority date | — |
| Expiry date | Sep 2, 2035 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02C20/30
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A gas containment apparatus for use with an end effector including at least one plasma head includes at least one enclosing structure coupled to the end effector. The enclosing structure is configured to capture a gas produced by the at least one plasma head. The gas containment apparatus also includes a duct coupled to the at least one enclosing structure and configured to channel the gas from within the enclosing structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.