Array substrate and manufacturing method thereof, display device
US9685467B2 · kind B2 · utility
0Cited by
3References
6Claims
0Family size
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Key dates
| Filing date | Mar 19, 2015 |
| Grant date | Jun 20, 2017 |
| Priority date | — |
| Expiry date | Mar 19, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/1368
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Embodiments of the present invention disclose an array substrate and a manufacturing method thereof, a display device, which relates to the display field, and can increase transmittance of the product, and also has improvement effect to defects such as crosstalk, flicker, etc. An embodiment of the present invention provides an array substrate, comprising: a substrate, a data line, a gate line, a thin film transistor and a pixel electrode formed on the substrate, the thin film transistor comprises a gate insulating layer, a part of the gate insulating layer corresponding to a light-transmissive area of a pixel is removed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.