Patent · US Active

Characterization of dielectric materials

US9689822B2 · kind B2 · utility

2Cited by
5References
15Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 22, 2015
Grant dateJun 27, 2017
Priority date
Expiry dateApr 12, 2035

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01N27/24
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A system and a method for characterizing a dielectric material are provided. The system and method generally include applying an excitation signal to electrodes on opposing sides of the dielectric material to evaluate a property of the dielectric material. The method can further include measuring the capacitive impedance across the dielectric material, and determining a variation in the capacitive impedance with respect to either or both of a time domain and a frequency domain. The measured property can include pore size and surface imperfections. The method can still further include modifying a processing parameter as the dielectric material is formed in response to the detected variations in the capacitive impedance, which can correspond to a non-uniformity in the dielectric material.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.