Maskless exposure device, maskless exposure method and display substrate manufactured by the maskless exposure device and the maskless exposure method
US9690204B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 20, 2015 |
| Grant date | Jun 27, 2017 |
| Priority date | — |
| Expiry date | Apr 8, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D86/60
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A maskless exposure device includes an exposure head including a digital micro-mirror device, the digital micro-mirror device being configured to scan an exposure beam to a substrate by reflecting a source beam from an exposure source; and a system control part configured to control the digital micro-mirror device by utilizing a graphic data system file. The graphic data system file includes data for a source electrode, a drain electrode and a channel portion between the source electrode and the drain electrode in a plan view. The channel portion includes a first portion extending in a direction perpendicular to a scan direction of the exposure head. A width of the first portion of the channel portion is defined to be a multiple of a pulse event generation of the exposure beam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.