Patent · US Active

Stripping apparatus and method using the same to clean glass substrates

US9694396B2 · kind B2 · utility

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7Claims
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Key dates

Filing dateOct 20, 2014
Grant dateJul 4, 2017
Priority date
Expiry dateMar 26, 2035

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/67248
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

The present disclosure provides a stripping apparatus including a cleaning device, a transition unit and a stripping device. The cleaning device includes a first cleaning unit, a second cleaning unit and a third cleaning unit. The stripping device is connected with the transition unit; the transition unit is further connected with the first cleaning unit; the first cleaning unit is further connected with the second cleaning unit; the second cleaning unit is further connected with the third cleaning unit. Temperatures of the first cleaning unit, the second cleaning unit and the third cleaning unit are gradually decreased. The temperature of the third cleaning unit is equal to the temperature of water injected into the third cleaning unit.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.