Deposition mask, method of manufacturing deposition mask, and method of manufacturing display apparatus
US9695522B2 · kind B2 · utility
1Cited by
1References
29Claims
0Family size
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Key dates
| Filing date | Nov 20, 2015 |
| Grant date | Jul 4, 2017 |
| Priority date | — |
| Expiry date | Nov 20, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/166
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A deposition mask including a mask body including a plurality of pattern holes; a plurality of protrusions protruding from the mask body; and a plurality of grooves formed in the mask body. A grain size of the mask body is in arrange of about 10 μm to about 1000 μm, and a difference between a maximum height of the plurality of protrusions and a maximum height of the plurality of grooves is equal to or less than 0.5 μm.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.