Method for measuring temperature of film in reaction chamber
US9696209B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 16, 2014 |
| Grant date | Jul 4, 2017 |
| Priority date | — |
| Expiry date | Sep 17, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01J5/0007
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method for measuring a temperature of a film in a reaction chamber is provided. The method includes: obtaining reflectivity sampling data R of a sampling point set in a detection area of the film for light with a wavelength λ, and thermal radiation value sampling data E of the sampling point set; obtaining a first correction factor α and a second correction factor γ according to values of at least two sampling data groups, wherein 0<α≦1, 0≦γ≦1; obtaining a blackbody radiation value Lb of the detection area of the film for the light with the wavelength λ according to the first correction factor α, the second correction factor γ and the values of the at least two sampling data groups; obtaining a temperature T of the detection area by looking up a table according to the blackbody radiation value Lb and the wavelength λ.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.