Manufacturing method of liquid crystal display
US9696602B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 19, 2014 |
| Grant date | Jul 4, 2017 |
| Priority date | — |
| Expiry date | Sep 11, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F2201/123
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for manufacturing a liquid crystal display includes: forming a first passivation layer and an organic layer, forming an edge of an inclined portion of the organic layer by partially removing the organic layer at a location where a first drain contact hole that exposes a drain electrode of a thin film transistor is formed, forming a second passivation layer including a third drain contact hole exposing the drain electrode, a first electrode including a second drain contact hole exposing the drain electrode, and the first drain contact hole through an etching process using one etching mask, and forming a second electrode on the second passivation layer. The first drain contact hole, the second drain contact hole, and the third drain contact hole overlap with each other, and a size of the second drain contact hole is greater than a size of the third drain contact hole.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.