Patent · US Active

Photosensitive compositions and applications thereof

US9696623B2 · kind B2 · utility

1Cited by
1References
5Claims
0Family size

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Key dates

Filing dateApr 12, 2016
Grant dateJul 4, 2017
Priority date
Expiry dateApr 12, 2036

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2924/181
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

The present invention relates to photosensitive compositions containing polynorbornene (PNB) polymers and certain additives that are useful for forming microelectronic and/or optoelectronic devices and assemblies thereof, and more specifically to compositions encompassing PNBs and certain hindered phenols as additives which are capable of controlling the adhesiveness by radiation.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.