Patent · US Active

Halogenated polysilane and plasma-chemical process for producing the same

US9701795B2 · kind B2 · utility

1Cited by
1References
2Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 27, 2009
Grant dateJul 11, 2017
Priority date
Expiry dateOct 23, 2033

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB01J2219/0894
  • WIPO fieldMacromolecular chemistry, polymers
  • WIPO sectorChemistry

Abstract

The present invention relates to a halogenated polysilane as a pure compound or a mixture of compounds each having at least one direct Si—Si bond, whose substituents consist exclusively of halogen or of halogen and hydrogen and in the composition of which the atomic ratio of substituent to silicon is at least 1:1.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.