Halogenated polysilane and plasma-chemical process for producing the same
US9701795B2 · kind B2 · utility
1Cited by
1References
2Claims
0Family size
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Key dates
| Filing date | May 27, 2009 |
| Grant date | Jul 11, 2017 |
| Priority date | — |
| Expiry date | Oct 23, 2033 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01J2219/0894
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
The present invention relates to a halogenated polysilane as a pure compound or a mixture of compounds each having at least one direct Si—Si bond, whose substituents consist exclusively of halogen or of halogen and hydrogen and in the composition of which the atomic ratio of substituent to silicon is at least 1:1.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.