Assembly for analyzing a light pattern caused by refraction and reflection at a precious stone
US9702825B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Feb 10, 2016 |
| Grant date | Jul 11, 2017 |
| Priority date | — |
| Expiry date | Feb 10, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2201/0634
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An assembly for analyzing a light pattern caused by refraction and reflection at a precious stone, comprising a light source for illuminating the precious stone, a retaining device for retaining the precious stone, a diffusing screen for imaging the light pattern, and a camera for recording the light pattern imaged on the diffusing screen. The assembly comprises a semi-transmitting optical element for deflecting, in a direction of the precious stone, light emitted by the light source and transmitting the light refracted and reflected at the precious stone.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.