Patent · US Active

Assembly for analyzing a light pattern caused by refraction and reflection at a precious stone

US9702825B2 · kind B2 · utility

0Cited by
10References
19Claims
0Family size

Assignee

Inventor

Key dates

Filing dateFeb 10, 2016
Grant dateJul 11, 2017
Priority date
Expiry dateFeb 10, 2036

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01N2201/0634
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

An assembly for analyzing a light pattern caused by refraction and reflection at a precious stone, comprising a light source for illuminating the precious stone, a retaining device for retaining the precious stone, a diffusing screen for imaging the light pattern, and a camera for recording the light pattern imaged on the diffusing screen. The assembly comprises a semi-transmitting optical element for deflecting, in a direction of the precious stone, light emitted by the light source and transmitting the light refracted and reflected at the precious stone.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.