Photomask, method of manufacturing optical element array, optical element array
US9703015B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 1, 2015 |
| Grant date | Jul 11, 2017 |
| Priority date | — |
| Expiry date | Jul 8, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B27/10
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photomask for an optical element array includes first and second optical elements. A light transmission rate distribution includes a first area where the first optical element is to be formed, a second area where the second optical element is to be formed, and a third area between the first and second areas, has a first light transmission rate at an end portion of the first area. A second light transmission rate is higher than the first light transmission rate at another end portion. A third light transmission rate at an end portion corresponds to a boundary between the second and third areas. A fourth light transmission rate is higher than the third light transmission rate at another end portion of the second area. The light transmission rate distribution along a first direction is higher than a segment connecting the second and third light transmission rates in the third area.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.