Onium salt, resist composition, and patterning process
US9703193B2 · kind B2 · utility
2Cited by
9References
19Claims
0Family size
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Key dates
| Filing date | Apr 27, 2016 |
| Grant date | Jul 11, 2017 |
| Priority date | — |
| Expiry date | Apr 27, 2036 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07J31/006
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
An onium salt having an anion moiety of a specific structure is an effective photoacid generator. A resist composition comprising the onium salt has the advantages of compatibility and reduced acid diffusion and forms a pattern with a good balance of sensitivity and MEF, rectangularity, and minimal defects.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.