Photopatternable materials and related electronic devices and methods
US9704997B2 · kind B2 · utility
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4References
19Claims
0Family size
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Key dates
| Filing date | Nov 16, 2015 |
| Grant date | Jul 11, 2017 |
| Priority date | — |
| Expiry date | Nov 16, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D86/60
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present polymeric materials can be patterned with relatively low photo-exposure energies and are thermally stable, mechanically robust, resist water penetration, and show good adhesion to metal oxides, metals, metal alloys, as well as organic materials. In addition, these polymeric materials can be solution-processed (e.g., by spin-coating), and can exhibit good chemical (e.g., solvent and etchant) resistance in the cured form.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.