Pulsed current sintering for surfaces of medical implants
US9707317B2 · kind B2 · utility
7Cited by
2References
53Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 4, 2012 |
| Grant date | Jul 18, 2017 |
| Priority date | — |
| Expiry date | Jul 24, 2034 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB22F2998/00
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
A porous medical implant and a method of making same is described. The medical implant comprises a porous surface formed by application of pulsed electrical energy ins such a way as to cause a localized heating in the surface of the material comprising portions of the implant. The method comprises a pulsed current sintering technique.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.