Sulfonic acid derivative compounds as photoacid generators in resist applications
US9709886B2 · kind B2 · utility
1Cited by
20References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 14, 2016 |
| Grant date | Jul 18, 2017 |
| Priority date | — |
| Expiry date | Sep 14, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/38
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Novel photoacid generator compounds are provided. Photoresist compositions that include the novel photoacid generator compounds are also provided. The invention further provides methods of making and using the photoacid generator compounds and photoresist compositions disclosed herein. The compounds and compositions are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.