Patent · US Active

Nitrocellulose-free nail polish compositions

US9713588B2 · kind B2 · utility

0Cited by
15References
24Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 31, 2011
Grant dateJul 25, 2017
Priority date
Expiry dateMay 20, 2032

Classification

  • Technology area (CPC A)Human Necessities
  • CPC primaryA61K2800/594
  • WIPO fieldPharmaceuticals
  • WIPO sectorChemistry

Abstract

The present invention relates to a nail polish composition comprising: at least one high gloss film forming agent chosen from a styrene maleic anhydride copolymer; at least one co-film forming agent chosen from an epoxy resin; at least one reactive agent chosen from a combination of a polyalkyleneamine and a polyurethane, at least one polyalkyleneamine, and at least one alkoxysilane comprising at least one solubilizing functional group; at least one solvent chosen from at least one volatile solvent and water; optionally, at least one plasticizer; and optionally, at least one colorant, wherein the composition does not require use of nitrocellulose and can be used to makeup or protect nails.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.