Patterned phase difference film and method for manufacturing same
US9720154B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 4, 2016 |
| Grant date | Aug 1, 2017 |
| Priority date | — |
| Expiry date | Aug 4, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/133633
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A pattern phase difference film is manufactured by a process including a laminate body formation step of applying a pattern alignment layer composition on a substrate to form a laminate body, a heat-drying layer formation step of heat-drying the composition to form a heat-dried layer, a pattern alignment layer formation step of irradiating a polarization pattern onto the heat-dried layer to form a pattern alignment layer, and a phase difference layer formation step of forming a phase difference layer including a rod-shaped compound on the pattern alignment layer. During the steps between the heat-drying layer formation step and the phase difference layer formation step, the heat-dried layer and the pattern alignment layer are exposed to the air for four hours or less.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.