Patent · US Active

Pattern definition of nanocellulose sheets through selective ashing via lithographic masking

US9720318B2 · kind B2 · utility

1Cited by
2References
10Claims
0Family size

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Key dates

Filing dateNov 25, 2016
Grant dateAug 1, 2017
Priority date—
Expiry dateNov 25, 2036

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/40
  • WIPO fieldMedical technology
  • WIPO sectorInstruments

Abstract

A masked etching process can prepare patterned nanocellulose for use in conformal electronics such as electrodermal structures might be adhered to human skin.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.