Patent · US Active

Deposition apparatus and deposition method using the same

US9724725B2 · kind B2 · utility

0Cited by
0References
15Claims
0Family size

Assignee

Inventor

Key dates

Filing dateDec 11, 2015
Grant dateAug 8, 2017
Priority date
Expiry dateDec 11, 2035

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10K71/166
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A deposition apparatus for manufacturing a display device is disclosed. In one aspect, the apparatus includes a substrate fixing portion configured to fix a deposition substrate to a lower portion thereof and a first mask transfer portion placed on one side of the substrate fixing portion and configured to move the deposition mask upwardly such that the deposition mask is formed spaced apart from the deposition substrate by a predetermined distance. The apparatus also includes a substrate transfer portion configured to move the deposition substrate such that the deposition substrate passes over the deposition mask. The apparatus further includes a mask spacing portion positioned on the substrate fixing portion and configured to maintain a substantially uniform distance between the deposition substrate and the deposition mask when the deposition substrate is moved and a deposition source configured to deposit a deposition material on the deposition substrate through the deposition mask.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.