Patent · US Active

Processing method for constraining lower melting point metals within ceramic laminates during sintering

US9724897B2 · kind B2 · utility

0Cited by
1References
18Claims
0Family size

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Key dates

Filing dateJan 7, 2015
Grant dateAug 8, 2017
Priority date
Expiry dateApr 19, 2035

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC04B2237/68
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A method is described. The method is a method for making a constraining ceramic assembly. The method includes applying at least one metallic electrode to a substrate. The method also includes applying a porous ceramic layer to the substrate to cover the metallic electrode. The method also includes sintering the substrate, the porous ceramic layer, and the metallic electrode together at a sintering temperature above a melting point of the metallic electrode.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.