Using multiple sources/detectors for high-throughput X-ray topography measurement
US9726624B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 10, 2015 |
| Grant date | Aug 8, 2017 |
| Priority date | — |
| Expiry date | Jun 10, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2223/6462
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An apparatus for X-ray topography includes a source assembly, a detector assembly, a scanning assembly and a processor. The source assembly is configured to direct multiple X-ray beams so as to irradiate multiple respective regions on a sample, wherein the regions partially overlap one another along a first axis of the sample and are offset relative to one another along a second axis of the sample that is orthogonal to the first axis. The detector assembly is configured to detect the X-ray beams diffracted from the sample and to produce respective electrical signals in response to the detected X-ray beams. The scanning assembly is configured to move the sample relative to the source assembly and the detector assembly along the second axis. The processor is configured to identify defects in the sample by processing the electrical signals, which are produced by the detector assembly while the sample is moved.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.