Process and apparatus for diamond synthesis
US9732440B2 · kind B2 · utility
1Cited by
16References
11Claims
0Family size
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Key dates
| Filing date | Nov 1, 2016 |
| Grant date | Aug 15, 2017 |
| Priority date | — |
| Expiry date | Nov 1, 2036 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/30
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present invention relates to a microwave plasma deposition process and apparatus for producing diamond, preferably as single crystal diamond (SCD). The process and apparatus enables the production of multiple layers of the diamond by the use of an extending device to increase the length and the volume of a recess in a holder containing a SCD substrate as layers of diamond are deposited. The diamond is used for abrasives, cutting tools, gems, electronic substrates, heat sinks, electrochemical electrodes, windows for high power radiation and electron beams, and detectors.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.