Array substrate, method for manufacturing the same and display device
US9735177B2 · kind B2 · utility
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8Claims
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Key dates
| Filing date | Dec 13, 2013 |
| Grant date | Aug 15, 2017 |
| Priority date | — |
| Expiry date | Feb 16, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D86/60
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The present invention provides an array substrate, a method for manufacturing the same and a display device, and relates to technical field of displays. The method for manufacturing an array substrate comprises forming a metal layer on a substrate and removing superficial metallic oxide on the metal layer by a washing process. The method for manufacturing an array substrate according to the present inversion can remove the superficial metal oxide on the metal layer and improve the performance of a TFT.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.