Fragmentation device with increased surface hardness and a method of producing the same
US9738947B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 17, 2015 |
| Grant date | Aug 22, 2017 |
| Priority date | — |
| Expiry date | Apr 19, 2036 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC21D2211/008
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A method of modifying material properties of a fragmentation device, includes providing a fragmentation device with a first surface, a first section, a second section, a second surface spaced apart from the first surface, a third section, and a fourth section disposed between the first, second, and third sections. The method further includes positioning the fragmentation device within a carbon-rich environment, and absorbing carbon from the carbon-rich environment into the first and second surfaces of the fragmentation device. Additionally, the method further includes increasing a content of carbon at the first and second surfaces of 0.06 wt. % carbon to 1.0 wt. % carbon and maintaining an original content of carbon of 0.01 wt. % carbon to 0.05 wt. % carbon at the fourth section of the fragmentation device by controlling penetration of the carbon into the fourth section.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.