Microwave plasma reactors and substrates for synthetic diamond manufacture
US9738970B2 · kind B2 · utility
1Cited by
30References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 11, 2014 |
| Grant date | Aug 22, 2017 |
| Priority date | — |
| Expiry date | Jan 2, 2036 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/12993
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present disclosure relates to substrates for use in microwave plasma reactors. Certain substrates include a cylindrical disc of a carbide forming refractory metal having a flat growth surface on which CVD diamond is to be grown and a flat supporting surface opposed to said growth surface. The cylindrical disc may have a diameter of 80 mm or more. The growth surface may have a flatness variation no more than 100 mm The supporting surface may have a flatness variation no more than 100 mm.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.