Vapor deposition methods to form group 8-containing films

US9738971B2 · kind B2 · utility

Assignee

• L'Air Liquide, Societe Anonyme Pour l'Etude et l'Exploitation des Procedes Georges Claude · FR

Inventors

• Grigory Nikiforov · Bound Brook, US
• Satoko Gatineau · Seoul, KR

Key dates

• Filing date: Dec 31, 2015
• Grant date: Aug 22, 2017
• Expiry date: Dec 31, 2035

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C16/18
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

Vapor deposition methods to form Group 8-containing films are disclosed. The vapor of a Group-8 containing film forming composition is introduced into a reactor containing a substrate. The Group 8-containing film forming compositions comprise silylamide-containing precursors, particularly {Fe[N(SiMe3)2]2}2. At least part of the silylamide-containing precursor is deposited onto the substrate to from the Group 8-containing film.