System, methods, and apparatus for production coatings of low-emissivity glass

US9739915B2 · kind B2 · utility

Assignee

• Guardian Industries Corp. · US

Inventors

• Guowen Ding · San Jose, US
• Jeremy Cheng · Cupertino, US
• Muhammad Imran · Hillsborough Township, US
• Minh Huu Le · San Jose, US
• Daniel Schweigert · Fremont, US
• Yongli Xu · Plymouth, US
• Guizhen Zhang · Santa Clara, US

Key dates

• Filing date: Dec 31, 2013
• Grant date: Aug 22, 2017
• Expiry date: May 12, 2035

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10T428/265
• WIPO field: Materials, metallurgy
• WIPO sector: Chemistry

Abstract

Disclosed herein are systems, methods, and apparatus for forming low emissivity panels. In some embodiments, a partially fabricated panel may be provided that includes a substrate, a reflective layer formed over the substrate, and a barrier layer formed over the reflective layer such that the reflective layer is formed between the substrate and the barrier layer. The barrier layer may include a partially oxidized alloy of three or more metals. A first interface layer may be formed over the barrier layer. A top dielectric layer may be formed over the first interface layer. The top dielectric layer may be formed using reactive sputtering in an oxygen containing environment. The first interface layer may prevent further oxidation of the partially oxidized alloy of the three or more metals when forming the top dielectric layer. A second interface layer may be formed over the top dielectric layer.