Patent · US Active

Method for fabrication of a silicon-based component with at least one optical illusion pattern

US9740174B2 · kind B2 · utility

0Cited by
3References
14Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 31, 2016
Grant dateAug 22, 2017
Priority date
Expiry dateOct 31, 2036

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG04D3/0046
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

The invention relates to a method for fabrication of a one-piece, silicon-based component of simple shape offering the illusion of faceting and/or chamfering for forming all or part of the exterior part of a timepiece.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.