Method to evaluate the presence of a source of x-ray beam inhomogeneity during x-ray exposure
US9741102B2 · kind B2 · utility
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Key dates
| Filing date | Jun 5, 2013 |
| Grant date | Aug 22, 2017 |
| Priority date | — |
| Expiry date | Apr 29, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH04N25/671
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A statistical analysis is performed on pixel values of at least one region of interest in an image obtained by substantially uniform irradiation of an x-ray detector and deciding upon the presence of a source of x-ray beam in-homogeneity by comparing the results of the statistical analysis with at least one predetermined acceptance criterion.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.