Etchant and method of manufacturing display device by using the same
US9741827B2 · kind B2 · utility
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7Claims
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Key dates
| Filing date | Oct 7, 2014 |
| Grant date | Aug 22, 2017 |
| Priority date | — |
| Expiry date | Oct 7, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D86/60
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An etchant composition is provided comprising a persulfate from 0.5 to 20 wt %; a fluoride compound from 0.01 to 2 wt %; an inorganic acid from 1 to 10 wt %; a N (nitrogen atom)-containing heterocyclic compound from 0.5 to 5 wt %; a chloride compound from 0.1 to 5 wt %; a copper salt from 0.05 to 3 wt %; an organic acid or an organic acid salt from 0.1 to 10 wt %; an electron-donating compound from at 0.1 to 5 wt %; and a solvent of the residual amount. Also provided is a method of manufacturing a display device by using the same.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.