Method for forming thin film conductors on a substrate
US9743516B2 · kind B2 · utility
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3References
14Claims
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Key dates
| Filing date | Dec 3, 2012 |
| Grant date | Aug 22, 2017 |
| Priority date | — |
| Expiry date | Jul 26, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K2203/1492
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A method for forming thin film conductors is disclosed. A thin film precursor material is initially deposited onto a porous substrate. The thin film precursor material is then irradiated with a light pulse in order to transform the thin film precursor material to a thin film such that the thin film is more electrically conductive than the thin film precursor material. Finally, compressive stress is applied to the thin film and the porous substrate to further increase the thin film's electrical conductivity.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.