Patent · US Active

Method of two-step parylene patterning and etching to release a parylene sandwiched device

US9743885B1 · kind B1 · utility

5Cited by
8References
16Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 12, 2014
Grant dateAug 29, 2017
Priority date
Expiry dateJun 27, 2035

Classification

  • Technology area (CPC A)Human Necessities
  • CPC primaryA61B2562/12
  • WIPO fieldMedical technology
  • WIPO sectorInstruments

Abstract

An example method involves: forming a first bio-compatible layer that defines a first side of a bio-compatible device; forming a conductive pattern over a portion of the first bio-compatible layer; mounting an electronic component to the electrical contacts; forming a second bio-compatible layer over the first bio-compatible layer, the electronic component, the conductive pattern, wherein the second bio-compatible layer defines a second side of the bio-compatible device; forming a first etch mask to partially cover the second bio-compatible layer, thereby exposing a first portion of the second bio-compatible layer; removing the first portion of the second bio-compatible layer; forming a second etch mask to partially cover the second bio-compatible layer, thereby exposing a second portion of the second bio-compatible layer; and removing the second portion of the second bio-compatible layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.