Polyurethane resin composition for support pad and polyurethane support pad using the same
US9745468B2 · kind B2 · utility
0Cited by
2References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 17, 2012 |
| Grant date | Aug 29, 2017 |
| Priority date | — |
| Expiry date | Feb 6, 2033 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08G2110/005
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
The present invention relates to a polyurethane resin composition for a support pad including a polyurethane resin, a DMF solvent, an anionic surfactant, and polyethylene glycol (PEG), and a polyurethane support pad including the polyurethane resin composition for a support pad. According to the present invention, long and large pores may be uniformly formed therein, and thus a support pad having an excellent compression rate and compression recovery rate may be provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.