Patent · US Active

Flow meter having a background pattern with first and second portions

US9746094B2 · kind B2 · utility

100Cited by

218References

43Claims

0Family size

Assignee

DEKA Products Limited Parternship · US

Inventors

Bob D. Peret · Bedford, US
Brian H. Yoo · Arlington, US
Derek G. Kane · Manchester, US
Dean Kamen · Bedford, US
Colin H. Murphy · Cambridge, US
John M. Kerwin · Manchester, US

Key dates

Filing date	Nov 11, 2015
Grant date	Aug 29, 2017
Priority date	—
Expiry date	Mar 25, 2036

Classification

Technology area (CPC G)Physics
CPC primaryG06T2207/30232
WIPO fieldAudio-visual technology
WIPO sectorElectrical engineering

Abstract

A flow meter includes a first image sensor, a background pattern, and at least one processor. The first image sensor has a first field of view and is positioned to view a drip chamber within the first field of view. The background pattern is positioned within the field of view of the first image sensor, and the background pattern includes first and second portions. The processor is operatively coupled to the first image sensor and configured to: receive a first image from the first image sensor, and estimate at least one parameter of liquid within the drip chamber in accordance with a distortion of the background pattern caused by the liquid as indicated by the first image.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.