Photoresist composition and method of manufacturing black matrix using the same
US9746767B2 · kind B2 · utility
1Cited by
2References
18Claims
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Key dates
| Filing date | Oct 13, 2015 |
| Grant date | Aug 29, 2017 |
| Priority date | — |
| Expiry date | Nov 12, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/325
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photoresist composition including 5 wt % to 10 wt % of a binder resin, 5 wt % to 10 wt % of a photopolymerization monomer, 1 wt % to 5 wt % of a photopolymerization initiator comprising an oxime ester-based compound and activated by light in a wavelength range of 400 nm to 410 nm, 5 wt % to 10 wt % of a black coloring agent, and a residual amount of a solvent.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.