Maskless exposure device, maskless exposure method and display substrate manufactured by the maskless exposure device and the maskless exposure method
US9746780B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 19, 2015 |
| Grant date | Aug 29, 2017 |
| Priority date | — |
| Expiry date | Jun 19, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70508
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A maskless exposure device includes an exposure head including a digital micro-mirror device and an exposure source, the digital micro-mirror device being configured to reflect a source beam outputted from the exposure source to a substrate and a system controller configured to control the digital micro-mirror device by using a graphic data system file. The graphic data system file includes data regarding patterns to be formed on the substrate. A pattern extending in a direction parallel to a scan direction of the exposure head includes a first pattern portion having a first width that is greater than a target width and a second pattern portion alternately disposed with the first pattern portion and having a second width that is less than the target width.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.