Coaxial microwave applicator for plasma production
US9750120B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jul 10, 2013 |
| Grant date | Aug 29, 2017 |
| Priority date | — |
| Expiry date | Dec 17, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H2242/10
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The disclosure includes a coaxial microwave applicator for plasma production, including a coaxial tube formed by a central core and an outer conductor separated from the central core by an annular space allowing propagation of microwaves. The applicator includes: a cylindrical permanent magnet disposed at the end of the central core; and at least one annular permanent magnet disposed at the end of the outer conductor, all of the magnets disposed at the end of the coaxial tube having the same direction of magnetization. The magnetization of the magnets forms a magnetic field suitable for generating, in a zone away from the end of the applicator, an electronic cyclotronic resonance coupling with the electric microwave field of the applicator. The external radius and the magnetization of the annular magnet are selected such that the magnetic field lines generated by the magnets pass through the coupling zone in a direction substantially parallel to the axis of the applicator.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.