Alpha alumina thin film for processing difficult-to-cut material and cast iron
US9752230B2 · kind B2 · utility
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Key dates
| Filing date | Nov 26, 2014 |
| Grant date | Sep 5, 2017 |
| Priority date | — |
| Expiry date | Nov 26, 2034 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C28/048
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Disclosed is an alpha alumina (α-Al2O3) thin film comprising the lower layer formed on the base material made from cemented carbide; and the α-Al2O3 thin film layer formed on the lower layer, wherein when the α-Al2O3 thin film layer is divided, from the total thickness (T) thereof, into a D1 layer which is from an interface layer to 0.15T, a D2 layer which is from 0.15T to 0.4T, and a D3 layer which is from 0.4T to 1T, an S1 (D3 layer grain size/D1 layer grain size) is 2-5.5 and an S2 (D2 layer grain size/D1 layer grain size) is 1.5-4.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.